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Design and fabrication of a SiN-Si dua-layer optical phased array chip

2020-06-28

 

Author(s): Wang, PF (Wang, Pengfei); Luo, GZ (Luo, Guangzhen); Xu, Y (Xu, Yang); Li, YJ (Li, Yajie); Su, YM (Su, Yanmei); Ma, JB (Ma, Jianbin); Wang, RT (Wang, Ruiting); Yang, ZX (Yang, Zhengxia); Zhou, X (Zhou, Xuliang); Zhang, YJ (Zhang, Yejin); Pan, JQ (Pan, Jiaoqing)

Source: PHOTONICS RESEARCH Volume: 8 Issue: 6 Pages: 912-919 DOI: 10.1364/PRJ.387376 Published: JUN 1 2020

Abstract: A SiN-Si dual-layer optical phased array (OPA) chip is designed and fabricated. It combines the low loss of SiN with the excellent modulation performance of Si, which improves the performance of Si single-layer OPA. A novel optical antenna and an improved phase modulation method are also proposed, and a two-dimensional scanning ran ge of 96 degrees x 14 degrees is achieved, which makes the OPA chip more practical. (C) 2020 Chinese Laser Press

Accession Number: WOS:000537961100021

ISSN: 2327-9125

Full Text: https://www.osapublishing.org/prj/abstract.cfm?uri=prj-8-6-912



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