Author(s): Zhang, X (Zhang, Xiang); Chen, ZL (Chen, Zhaolong); Chang, HL (Chang, Hongliang); Yan, JC (Yan, Jianchang); Yang, SY (Yang, Shenyuan); Wang, JX (Wang, Junxi); Gao, P (Gao, Peng); Wei, TB (Wei, Tongbo)

Source: JOVE-JOURNAL OF VISUALIZED EXPERIMENTS Issue: 160 Article Number: e60167 DOI: 10.3791/60167 Published: JUN 2020

Abstract: This protocol demonstrates a method for graphene-assisted quick growth and coalescence of AlN on nano-pattened sapphire substrate (NPSS). Graphene layers are directly grown on NPSS using catalyst-free atmospheric-pressure chemical vapor deposition (APCVD). By applying nitrogen reactive ion etching (RIE) plasma treatment, defects are introduced into the graphene film to enhance chemical reactivity. During metal-organic chemical vapor deposition (MOCVD) growth of AlN, this N-plasma treated graphene buffer enables AlN quick growth, and coalescence on NPSS is confirmed by cross-sectional scanning electron microscopy (SEM). The high quality of AlN on graphene-NPSS is then evaluated by X-ray rocking curves (XRCs) with narrow (0002) and (10-12) full width at half-maximum (FWHM) as 267.2 arcsec and 503.4 arcsec, respectively. Compared to bare NPSS, AlN growth on graphene-NPSS shows significant reduction of residual stress from 0.87 GPa to 0.25 Gpa, based on Raman measurements. Followed by AlGaN multiple quantum wells (MQWS) growth on graphene-NPSS, AlGaN-based deep ultraviolet light-emitting-diodes (DUV LEDs) are fabricated. The fabricated DUV-LEDs also demonstrate obvious, enhanced luminescence performance. This work provides a new solution for the growth of high quality AlN and fabrication of high performance DUV-LEDs using a shorter process and less costs.

Accession Number: WOS:000546499200071

PubMed ID: 32658181

ISSN: 1940-087X

Full Text: https://www.jove.com/t/60167/graphene-assisted-quasi-van-der-waals-epitaxy-aln-film-on-nano